| Introduction | Perspectives on XPS and AES David Briggs and John Grant, XPS: Basic Principles, Spectral Features and Qualitative Analysis David Briggs, AES: Basic Principles, Spectral Features and Qualitative Analysis John Grant |
| Instrumentation | Surface Analysis: The Specimens Journey from Collection, Storage, Transportation, and Preparation to Analysis Joe Geller, XPS: Instrumentation and Performance Ian Drummond, AES: Instrumentation and Performance Masato Kudo, Instrument Calibration for AES and XPS Martin Seah, Analysing Insulators with XPS and AES Mike Kelly, Beam Effects During AES and XPS Analysis Don Baer, Mark Engelhard, Dan Gaspar and Scott Lea |
| Surface Sensitivity | Electron Transport in Solids Wolfgang Werner, Electron Attenuation Lengths Shigeo Tanuma |
| Quantification | Quantification of Nanostructures by Electron Spectroscopy Sven Tougaard, Quantification in AES and XPS Martin Seah, The Use of Chemometrics in AES and XPS Data Treatment Bill Stickle |
| Spectral Interpretation | XPS Lineshapes and Curve-fitting Neal Fairley, Chemical Effects in XPS Laszlo Kover, Chemical Information from Auger Lineshapes Dave Ramaker, The Auger Parameter Giuliano Moretti, XPS Valence bands studied by XPS Peter Sherwood, Structural Effects in XPS and AES: Diffraction Jürg Osterwalder, Electron Backscattering and Channeling Ding Ze-jun and Ryuichi Shimizu |
| Depth Profiling | AES/XPS Depth Profiling Thomas Wagner, Jy Wang and Siegfried Hofmann, Angle Resolved XPS Peter Cumpson |
| Imaging | XPS Imaging Kateryna Artyushkova and Julia Fulghum, Processing, Interpretation and Quantification of Auger Images Martin Prutton |
| Developing Aspects | X-ray Photoelectron Spectroscopy and Imaging at Synchrotrons Giorgio Margaritondo, Total Reflection X-ray Photoelectron Spectroscopy (TRXPS) Yoshitoki Iijima, Ion-Excited Auger Electron Spectroscopy John Grant, Positron-Annihilation Induced AES (PAES) Toshiyuki Ohdaira, Electron Coincidence Measurements Steve Thurgate, Recent Developments in the Theory of Auger Spectroscopy Peter Weightman |
| Appendices | XPS BE, AES KE, Beam Damage, Manufacturers, Software, Databases, Standards |
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