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Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
[1901019047]
£180.00

Edited by David Briggs and John T. Grant

If “Briggs and Seah” has been your guide in the past, you will want this book.

Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS or ESCA) are well-established techniques for surface analysis and also (when combined with sputter depth profiling) for thin film and interface analysis.

This book is the first comprehensive treatment of the subject for over 10 years, during which time there have been many advances in instrumentation and performance, understanding of electron spectroscopy fundamentals, experimental methodology and data interpretation, which have markedly enhanced the capabilities of AES and XPS. All this new information is now integrated into a thoroughly up-to-date reference volume for the benefit of researcher and practical analyst alike.

31 chapters cover the following areas: perspectives and history; basic principles and spectral features; instrumentation, sample handling and beam effects; electron transport and surface sensitivity; quantification; spectral interpretation and structural effects; depth profiling; imaging; developing aspects. There are also extensive Appendices of reference data.

The authors are all internationally recognised and come from Australia, Europe, Japan and the USA.
Hardback
Published: 2003
Pages: xi + 899



Contents

Preface
Dedication

Perspectives and basic principles
1. Perspectives on XPS and AES
David Briggs and John T. Grant
2. XPS: Basic Principles, Spectral Features and Qualitative Analysis
David Briggs
3. AES: Basic Principles, Spectral Features and Qualitative Analysis
John T. Grant

Sample handling, instrumentation and beam effects
4. Specimen Preparation and Handling
Joseph Geller
5. XPS: Instrumentation and Performance
Ian W. Drummond
6. AES Instrumentation and Performance
Masato Kudo
7. Instrument Calibration for AES and XPS
Martin P. Seah
8. Analysing Insulators with XPS and AES
Michael A. Kelly
9. Beam Effects During AES and XPS Analysis
Don R. Baer, Dan J. Gaspar, Mark H. Engelhard and A.Scott Lea

Surface sensitivity
10. Electron Transport in Solids
Wolfgang S.M. Werner
11. Electron Attenuation Lengths
Shigeo Tanuma

Quantification
12. Quantification of Nano-structures by Electron Spectroscopy
Sven Tougaard
13. Quantification in AES and XPS
Martin P. Seah

Spectral interpretation
14. The Use of Chemometrics in AES and XPS Data Treatment
William F. Stickle
15. XPS Lineshapes and Curve Fitting
Neal Fairley
16. Chemical Effects in XPS
Laszlo Kövér
17. Chemical Information from Auger Lineshapes
David E. Ramaker
18. The Auger Parameter
Giuliano Moretti
19. Valence Bands Studied by XPS
Peter M.A. Sherwood

Structural effects
20. Structural Effects in XPS and AES: Diffraction
J. Osterwalder
21. Electron Backscattering and Channelling
Ding Ze-jun and Ryuichi Shimizu

Depth profiling
22. Sputter Depth Profiling in AES and XPS
Thomas Wagner, Jiang Y. Wang and Siegfried Hofmann
23. Angle-Resolved X-Ray Photoelectron Spectroscopy
Peter J. Cumpson

Imaging
24. XPS Imaging
Kateryna Artyushkova and Julia E. Fulghum
25. Processing, Interpretation and Quantification of Auger Images
Martin Prutton

Developing aspects
26. X-ray Photoelectron Spectroscopy and Imaging at Synchrotrons
G. Margaritondo
27. Total Reflection X-ray Photoelectron Spectroscopy
Yoshitoki Iijima
28. Ion-Excited Auger Electron Spectroscopy
John T. Grant
29. Positron-Annihilation-Induced Auger Electron Spectroscopy
Toshiyuki Ohdaira and Ryoichi Suzuki
30. Electron Coincidence Measurements
Stephen M. Thurgate
31. Recent Developments in the Theory of Auger Spectroscopy
Peter Weightman

Appendices
A. Peak Positions from Mg X-Rays and from Al X-Rays by Atomic Number
B. Peak Positions from Mg X-Rays and from Al X-Rays in Numerical Order
C. Auger Kinetic Energies and Sensitivity Factors by Atomic Number
D. Auger Kinetic Energies in Numerical Order
E. Polymer C 1s Chemical Shifts
F. Comparing Beam Damage Rates Using Susceptibility Tables
D.R. Baer, M.H. Engelhard, A.S. Lea and D.J. Gaspar
G. Manufacturers of AES and XPS Systems
John T. Grant
H. Software for Processing AES and XPS Data
John T. Grant
I. Databases
John T. Grant
J. Measurement and Documentary Standards
John T. Grant
K. Internet Resources
John T. Grant
Subject Index

This product was added to our catalog on Friday 22 August, 2003.
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